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https://hdl.handle.net/2440/41107
Type: | Conference paper |
Title: | Ultrafast pulsed laser deposition of chalcogenide glass films for low-loss optical waveguides |
Author: | Luther-Davies, B. Kolev, V. Lederer, M. Ruan, Y. Samoc, M. Jarvis, R. Rode, A. Giesekus, J. Du, K. Duering, M. |
Citation: | Materials Research Society Symposium Proceedings, 22-23 April, 2003 / Douglas B. Chrisey ... [et al.] (eds.): pp.131-142 |
Publisher: | Materials Research Society |
Publisher Place: | America |
Issue Date: | 2003 |
Series/Report no.: | Materials Research Society symposium proceedings ; v. 780 |
ISBN: | 1558997172 |
Conference Name: | Symposium on Advanced Optical Processing of Materials (2003 : San Francisco, Calif.) |
Abstract: | Ultra-fast pulsed laser deposition using high-repetition-rate short-pulse lasers has been shown to provide high optical quality, super smooth thin films free of scattering centres. The optimized process conditions require short ps or sub-ps pulses with repetition rate in the range 1-100 MHz, depending on the target material. Ultra-fast pulsed laser deposition was used to successfully deposit atomically-smooth, 5micron thick As2S3 films. The as-deposited films were photosensitive at wavelengths close to the band edge (=520 nm) and waveguides could be directly patterned into them by photo-darkening using an Argon ion or frequency doubled Nd:YAG laser. The linear and nonlinear optical properties of the films were measured as well as the photosensitivity of the material. The optical losses in photo-darkened waveguides were <0.2 dB/cm at wavelengths beyond 1200nm and <0.1 dB/cm in as-deposited films. The third order nonlinearity, n2,As2S3, was measured using both four-wave mixing and the z-scan technique and varied with wavelength from 100 to 200 times fused silica (n2,Silica =3¥10-16 cm2/W) between 1500nm and 1100nm with low nonlinear absorption. Encouraged by the Ultrafast laser deposition results, we have built a new specialized mode-locked picosecond laser system for deposition of optical films and for laser formation of nanoclusters. The newly developed “state of the art” powerful Nd:YVO laser can operate over a wide range of wavelengths, intensities, and repetition rates in MHz range. A brief description of the 50W laser installation is presented. |
Rights: | © Materials Research Society |
Description (link): | http://journals.cambridge.org/action/displayAbstract?fromPage=online&aid=8084721&fulltextType=RA&fileId=S1946427400141764 |
Appears in Collections: | Aurora harvest 6 Chemistry and Physics publications |
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