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https://hdl.handle.net/2440/63185
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DC Field | Value | Language |
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dc.contributor.author | Flavel, B. | - |
dc.contributor.author | Yu, J. | - |
dc.contributor.author | Shapter, J. | - |
dc.contributor.author | Quinton, J. | - |
dc.date.issued | 2007 | - |
dc.identifier.citation | Carbon, 2007; 45(13):2551-2558 | - |
dc.identifier.issn | 0008-6223 | - |
dc.identifier.issn | 1873-3891 | - |
dc.identifier.uri | http://hdl.handle.net/2440/63185 | - |
dc.description.abstract | A monolayer of methyl terminated hexadecyltrichlorosilane was self-assembled onto a p-type silicon (1 0 0) substrate to provide a resist for electrochemical anodisation with an atomic force microscope cantilever. Through precise control of the cantilever's position on the surface and the applied bias voltage, a variety of different surface architectures have been fabricated on the substrate. Single-walled carbon nanotubes (SWCNT), with high carboxylic acid functionality, have been immobilised to these etched regions using a condensation reaction. Highly selective condensation has been shown to be possible, both directly onto etched silicon regions as well as with the use of amine terminated 3-aminopropyltriethoxysilane as a molecular anchor. This has enabled the controlled attachment of nanotubes on nanoscale features. © 2007 Elsevier Ltd. All rights reserved. | - |
dc.description.statementofresponsibility | Benjamin S. Flavel, Jingxian Yu, Joseph G. Shapter, Jamie S. Quinton | - |
dc.language.iso | en | - |
dc.publisher | Pergamon-Elsevier Science Ltd | - |
dc.rights | Copyright © 2007 Elsevier Ltd. All rights reserved. | - |
dc.source.uri | http://dx.doi.org/10.1016/j.carbon.2007.08.026 | - |
dc.title | Patterned attachment of carbon nanotubes to silane modified silicon | - |
dc.type | Journal article | - |
dc.identifier.doi | 10.1016/j.carbon.2007.08.026 | - |
pubs.publication-status | Published | - |
dc.identifier.orcid | Yu, J. [0000-0002-6489-5988] | - |
Appears in Collections: | Aurora harvest 5 Chemistry and Physics publications |
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