Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/69051
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Type: Journal article
Title: Island growth in electrodeposition
Author: Guo, L.
Oskam, G.
Radisic, A.
Hoffmann, P.
Searson, P.
Citation: Journal of Physics D: Applied Physics, 2011; 44(44):1-12
Publisher: IOP
Issue Date: 2011
ISSN: 0022-3727
1361-6463
Statement of
Responsibility: 
Lian Guo, Gerko Oskam, Aleksandar Radisic, Peter M Hoffmann and Peter C Searson
Abstract: Electrochemical deposition of metals onto foreign substrates usually occurs through Volmer–Weber island growth. The mechanism of island nucleation and growth dictates the shape, orientation and number density of islands, and ultimately, the structure and properties of thin films. With increasing emphasis on deposition of ultrathin films and nanostructures, it is critically important to understand the kinetics of nucleation and growth. Here we provide a comprehensive review of island growth in electrodeposition and summarize methods for mechanistic analysis in both the kinetic and diffusion limited regimes.
Rights: © 2011 IOP Publishing
DOI: 10.1088/0022-3727/44/44/443001
Published version: http://dx.doi.org/10.1088/0022-3727/44/44/443001
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