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https://hdl.handle.net/2440/69051
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Type: | Journal article |
Title: | Island growth in electrodeposition |
Author: | Guo, L. Oskam, G. Radisic, A. Hoffmann, P. Searson, P. |
Citation: | Journal of Physics D: Applied Physics, 2011; 44(44):1-12 |
Publisher: | IOP |
Issue Date: | 2011 |
ISSN: | 0022-3727 1361-6463 |
Statement of Responsibility: | Lian Guo, Gerko Oskam, Aleksandar Radisic, Peter M Hoffmann and Peter C Searson |
Abstract: | Electrochemical deposition of metals onto foreign substrates usually occurs through Volmer–Weber island growth. The mechanism of island nucleation and growth dictates the shape, orientation and number density of islands, and ultimately, the structure and properties of thin films. With increasing emphasis on deposition of ultrathin films and nanostructures, it is critically important to understand the kinetics of nucleation and growth. Here we provide a comprehensive review of island growth in electrodeposition and summarize methods for mechanistic analysis in both the kinetic and diffusion limited regimes. |
Rights: | © 2011 IOP Publishing |
DOI: | 10.1088/0022-3727/44/44/443001 |
Published version: | http://dx.doi.org/10.1088/0022-3727/44/44/443001 |
Appears in Collections: | Aurora harvest IPAS publications |
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