Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/84390
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Type: Journal article
Title: High-power solid-state sapphire whispering gallery mode maser
Author: Creedon, D.
Benmessai, K.
Tobar, M.
Hartnett, J.
Bourgeois, P.
Kersale, Y.
Le Floch, J.
Giordano, V.
Citation: IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control, 2010; 57(3):641-645
Publisher: IEEE-Inst Electrical Electronics Engineers Inc
Issue Date: 2010
ISSN: 0885-3010
1525-8955
Statement of
Responsibility: 
Daniel L. Creedon, Karim Benmessaï, Michael E. Tobar, John G. Hartnett, Pierre-Yves Bourgeois, Yann Kersale, Jean-Michel Le Floch, and Vincent Giordano
Abstract: We present new results on a cryogenic solid-state maser frequency standard, which relies on the excitation of whispering gallery (WG) modes within a doped monocrystalline sapphire resonator (alpha-Al2O3). Included substitutively within the highest purity HEMEX-grade sapphire crystal lattice are Fe2+ impurities at a concentration of parts per million, an unavoidable result of the manufacturing process. Mass conversion of Fe2+ to Fe3+ ions was achieved by thermally annealing the sapphire in air. Above-threshold maser oscillation was then excited in the resonator at zero applied DC magnetic field by pumping high-Q WG modes coincident in frequency with the electron spin resonance (ESR) energy levels of the Fe3+ spin population. A 2 stage annealing process was undertaken for a sapphire resonator with exceptionally low Fe3+ concentration, resulting in an improvement of 6 orders of magnitude in output power for this particular crystal, and exceeding the previous best implementation of our scheme in another crystal by nearly 20 dB. This represents an output signal 7 orders of magnitude more powerful than a typical commercial hydrogen maser. At this power level, we estimate a limit on the frequency stability of order 1 x 10(-17)/square root(tau) due to the Schawlow-Townes fundamental thermal noise limit.
Rights: © 2010 IEEE
DOI: 10.1109/TUFFC.2010.1460
Published version: http://dx.doi.org/10.1109/tuffc.2010.1460
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Chemistry and Physics publications

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